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Table I-11 to Subpart I of Part 98—Default Emission Factors (1-U<sub>ij</sub>) for Gas Utilization Rates (U<sub>ij</sub>) and By-Product Formation Rates (B<sub>ijk</sub>) for Semiconductor Manufacturing for Use With the Stack Test Method

Default Emission Factors (1-U<sub>ij</sub>) for Gas Utilization Rates (U<sub>ij</sub>) and By-Product Formation Rates (B<sub>ijk</sub>) for Semiconductor Manufacturing for Use With the Stack Test Method

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Displayed edition2026-04-15
Last updated2026-04-15

Table I-11 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-11 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

[150 mm and 200 mm Wafers]

All processesProcess gas i
CF4C2 F6CHF3CH2 F2C2 HF5CH3 FC3 F8C4 F8NF3NF3

Remote
SF6C4 F6C5 F8C4 F8 O
1-Ui0.790.550.510.130.0640.700.400.120.180.0280.580.0830.0720.14
BCF4NA0.190.0850.0790.077NA0.200.110.110.0150.130.095NA0.13
BC2 F60.027NA0.0350.0250.0240.0034NA0.0190.0059NA0.100.0730.0140.045
BC4 F8NANANANANANANANANANANANANANA
BC3 F8NANANANANANANANANANANANANANA
BC5 F80.00077NA0.0012NANANANA0.0043NANANANANANA
BCHF30.0600.0020NA0.049NANANA0.020NANA0.00110.0660.0039NA
BF2NANANANANANANANANA0.50NANANANA
Notes: NA = Not applicable; i.e., there are no applicable emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.

[89 FR 31921, Apr. 25, 2024]