40 CFR Part 98 Appendix Table I-12 to Subpart I of Part 98 | Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-12 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-12 to Subpart I of Part 98—Default Emission Factors (1-U_ij) for Gas Utilization Rates (U_ij) and By-Product Formation Rates (B_ijk) for Semiconductor Manufacturing for Use With the Stack Test Method

[300 mm and 450 mm Wafers]

All processes	Process gas i
CF₄	C₂ F₆	CHF₃	CH₂ F₂	CH₃ F	C₃ F₈	C₃ F₈ Remote	C₄ F₈	NF₃	NF₃ Remote	SF₆	C₄ F₆	C₅ F₈	C₄ F₈ O
1-U_i	0.65	0.80	0.37	0.20	0.30	0.30	0.063	0.183	0.19	0.018	0.30	0.15	0.100	NA
BCF₄	NA	0.21	0.076	0.060	0.029	0.21	NA	0.045	0.040	0.037	0.033	0.059	0.109	NA
BC₂ F₆	0.058	NA	0.058	0.043	0.0093	0.18	NA	0.027	0.0204	NA	0.041	0.062	0.083	NA
BC₄ F₆	0.0083	NA	0.01219	NA	0.001	NA	NA	0.008	NA	NA	NA	NA	NA	NA
BC₄ F₈	0.0046	NA	0.00272	0.054	0.007	NA	NA	NA	NA	NA	NA	0.0051	NA	NA
BC₃ F₈	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	0.00012	NA
BCH₂ F₂	0.005	NA	0.0024	NA	0.0033	NA	NA	0.0021	0.00034	0.00088	0.000020	0.000030	NA	NA
BCH₃ F	0.0061	NA	0.027	0.0036	NA	0.0007	NA	0.0063	0.0036	0.0028	0.0082	0.00065	NA	NA
BCHF₃	0.012	NA	NA	0.057	0.016	0.012	NA	0.028	0.0106	0.000059	0.0039	0.017	0.0069	NA
BF₂	NA	NA	NA	NA	NA	NA	NA	NA	NA	0.50	NA	NA	NA	NA

[89 FR 31922, Apr. 25, 2024]

Table I-12 to Subpart I of Part 98—Default Emission Factors (1-U<sub>ij</sub>) for Gas Utilization Rates (U<sub>ij</sub>) and By-Product Formation Rates (B<sub>ijk</sub>) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-12 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method