Table I-8 to Subpart I of Part 98—Default Emission Factors (1-UN2O,j) for N2O Utilization (UN2O,j)
| Manufacturing type/process type/wafer size | N2 O |
|---|---|
| Semiconductor Manufacturing: | |
| 200 mm or Less: | |
| CVD 1-Ui | 1.0 |
| Other Manufacturing Process 1-Ui | 1.0 |
| 300 mm or greater: | |
| CVD 1-Ui | 0.5 |
| Other Manufacturing Process 1-Ui | 1.0 |
| LCD Manufacturing: | |
| CVD Thin Film Manufacturing 1-Ui | 0.63 |
| All other N2 O Processes | 1.0 |
[89 FR 31921, Apr. 25, 2024]