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Table I-8 to Subpart I of Part 98—Default Emission Factors (1-UN<sub>2</sub>O<sub>,j</sub>) for N<sub>2</sub>O Utilization (UN<sub>2</sub>O<sub>,j</sub>)

Default Emission Factors (1-UN<sub>2</sub>O<sub>,j</sub>) for N<sub>2</sub>O Utilization (UN<sub>2</sub>O<sub>,j</sub>)

CorpusDaily eCFR
Displayed edition2026-04-15
Last updated2026-04-15

Table I-8 to Subpart I of Part 98—Default Emission Factors (1-UN2O,j) for N2O Utilization (UN2O,j)

Table I-8 to Subpart I of Part 98—Default Emission Factors (1-UN2 O,j) for N2 O Utilization (UN2 O,j)

Manufacturing type/process type/wafer sizeN2 O
Semiconductor Manufacturing:
200 mm or Less:
CVD 1-Ui1.0
Other Manufacturing Process 1-Ui1.0
300 mm or greater:
CVD 1-Ui0.5
Other Manufacturing Process 1-Ui1.0
LCD Manufacturing:
CVD Thin Film Manufacturing 1-Ui0.63
All other N2 O Processes1.0

[89 FR 31921, Apr. 25, 2024]